|
|
 |
| |
|
|
|
A Comprehensive Review of Preparation Methods, Parameters and Deposition Analysis of CuO/ZnO Thin Films |
|
|
|
PP: 213-224 |
|
|
|
doi:10.18576/ijtfst/130306
|
|
|
|
Author(s) |
|
|
|
T. Nimalan,
M. Rigana Begam,
|
|
|
|
Abstract |
|
|
| The purpose of this review paper is to present an analysis of the various thin film deposition methods, parameters, advantages and disadvantages and deposition analysis of copper and zinc oxide thin films. A thin film is a very thin effective layer of material ranging from a few nanometers to several micrometers in thickness. Thin film deposition methods are classified commonly in two categories. The first one is physical deposition methods, and the second one is chemical deposition methods. This research paper describes various physical and chemical deposition methods and conditions for copper and zinc oxide thin film preparations. From our review work, various deposition parameters are analyzed which are useful for deposition of high-quality low-cost metal oxide thin film.
|
|
|
|
|
|
|
|
