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Particle Deposition of Diamond-Like-Carbon on Silicon Wafers using Inductively Coupled PECVD |
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PP: 233-238 |
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doi:10.18576/ijtfst/110211
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Author(s) |
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Vijaykumar S. Jatti,
Meena Laad,
Vinaykumar S. Jatti,
Venkat Sreenivas Pulii,
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Abstract |
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| Coating a surface with an appropriate particle layer changes the surface material properties and is an important tool for friction and wear reduction. Diamond-Like carbon (DLC) coatings are highly in use for various applications owing to their characteristic properties such as low friction and low wear resistance, and high hardness value. In the present work, DLC particle films on p-type Si substrates by inductively coupled plasma enhanced chemical vapour deposition(IC-PECVD) were deposited. Fourier transform infrared spectroscopy revealed that DLC films were composed of sp3 and sp2 C-H bonds. Raman Spectroscopy was used for investigations into sp3/sp2 ratio of the deposited carbon particles bonding. hardness and Young’s modulus were evaluated by indentation method using nano-hardness tester. The results showed that the deposited IC-PECVD DLC particle film had excellent chemical and mechanical properties. The developed films showed high value of hardness of 18 GPa, Young’s modulus 190 GPa and a minimum ID/IG ratio of 0.18.
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