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Study of the Effects of Annealing Temperature on the Properties of ZnO Thin Films Grown by Spray Pyrolysis Technique for Photovoltaic Applications |
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PP: 19-28 |
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doi:10.18576/ijtfst/110103
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Author(s) |
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K. Salim,
M. N. Amroun,
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Abstract |
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Zinc oxide (ZnO) thin films deposited on glass substrates at 300 °C by spray pyrolysis technique and then annealed at different temperatures ranging from 300 to 400 °C for 1 hour in air. The effects of the annealing temperature on the structural, optical and electrical properties of the ZnO thin films were studied. X-ray diffraction suggests that a hexagonal wurtzite structure with a strong (002) preferred orientation and the crystallite size increases with annealing temperature. The optical transmittance spectra showed transmittance higher about 82% in Vis and IR region of the annealed films at 375 °C. The direct optical band gap rises from 3.17 eV to 3.27 eV for as-deposited and annealed ZnO thin film at 375 °C, respectively. The resistivity values of the samples have changed from 6.27.10+2 to 7.50.10+1 (Ω.cm) with annealing temperature.
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