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05- International Journal of Thin Film Science and Technology
An International Journal
               
 
 
 
 
 
 
 
 
 
 
 
 

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Volumes > Vol. 9 > No. 1

 
   

Analytical Modelling and Simulation of Highly Sensitive n- RADFET Dosimeter

PP: 41-49
doi:10.18576/ijtfst/090107
Author(s)
Srijan Pathak, Spriha Singh, Tanya Jha, Ankush Agrawa, Shweta Tripathi,
Abstract
In the present paper, we have developed a model of a n-RADFET dosimeter device. Moreover, the study has addressed the effects of ionizing radiation on the surface potential and threshold voltage characteristics of the device. In addition, a detailed simulation analysis of the device has been conducted to obtain some further results. The study indicated that high sensitivity can be obtained for RADFET using n-MOSFET device. The results are expected to benefit in establishing the effectiveness of n-RADFET device as a dosimeter.

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