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Short Review of Factors Affecting Chemical Bath Deposition Method for Metal Chalcogenide Thin Films |
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PP: 43-53 |
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doi:10.18576/ijtfst/080203
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Author(s) |
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Fekadu Gashaw Hone,
Tizazu Abza,
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Abstract |
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| Thin film materials are important because of their potential low cost processing with minimal material usage while fulfilling application requirements. Thin films also enable applications where low weight and mechanical flexibility are decisive. A number of studies verified that their physical and chemical properties are highly dependable on the deposition methods. Thin films can be synthesized by varieties of physical and chemical deposition techniques. Among these techniques chemical bath deposition (CBD) is one of the most suitable routes to get uniform, well adherent and good reproducibility thin films. Moreover, currently it attracts considerable attention due to its low temperature compatibility, large area deposition with better homogeneity and cost effectiveness. But there are lots of factors affecting the deposition mechanism and the quality of the thin films. Hence, it is very helpful to know about these different factors which influence CBD method. The intention of this review paper is to present a screening of different works carried out so far to achieve a better understanding of the major factors affecting chemical bath deposition method in order to get the best out of this deposition technique. |
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