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Variation of Distribution of Concentration of Implanted Impurity with into Account Mismatch-Induced Stresses under Influence of Variation of Substrate Temperature |
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PP: 9-29 |
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doi:10.18576/ijtfst/080103
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Author(s) |
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E. L. Pankratov,
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Abstract |
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| In this paper, an analysis is made of the mutual effect of radiation damage to the heterostructure during ion doping, substrate temperature during doping, and mismatch-induced stresses. |
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