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05- International Journal of Thin Film Science and Technology
An International Journal
               
 
 
 
 
 
 
 
 
 
 
 
 

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Volumes > Vol. 7 > No. 2

 
   

Influence of Deposition Parameters on Optical Properties of Sputtered Tungsten Oxide Films

PP: 61-65
doi:10.18576/ijtfst/070202
Author(s)
Christopher Mkirema Maghanga,
Abstract
Thin films of tungsten oxide were deposited on glass substrates at different temperatures and O2/Ar ratios using DC Magnetron sputtering system. The samples were characterized using x-ray diffractometry and spectrophotometer structurally and optically respectively. Analysis of the results reveals dependence of structure on thickness and temperature. The O2/Ar ratio is also found to influence the optical properties appreciably for the entire wavelength range studied. Visual inspection of the films show that O2/Ar ratio influences the coloration of the film which varies from clear to dark blue for high to low O2/Ar ratios respectively.

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